Reaction micro- and nano-imprint lithography with polymers
The objectives of the proposed Project are as follows: a) Development of High Aspect Ratio Micro- and Nano-Imprint Lithography for patterning over large surface areas. b) Development of soft-on-hard mold technology as an enabling technology for low pressure molding of high aspect ratio polymeri...
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| Format: | Research Report |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/6969 |
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| Institution: | Nanyang Technological University |
| Summary: | The objectives of the proposed Project are as follows:
a) Development of High Aspect Ratio Micro- and Nano-Imprint Lithography for patterning over large surface areas.
b) Development of soft-on-hard mold technology as an enabling technology for low pressure molding of high aspect ratio polymeric micro-structures and nano-structures.
c) Development of ultrathin polymer film coating or grafting for release application.
d) Development of novel release coating with good release and durability. |
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