Reaction micro- and nano-imprint lithography with polymers

Reaction micro- and nano-imprint lithography with polymers

The objectives of the proposed Project are as follows: a) Development of High Aspect Ratio Micro- and Nano-Imprint Lithography for patterning over large surface areas. b) Development of soft-on-hard mold technology as an enabling technology for low pressure molding of high aspect ratio polymeri...

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Main Author: Chan, Mary Bee Eng.
Other Authors: School of Mechanical and Production Engineering
Format: Research Report
Published: 2008
Subjects:
DRNTU::Engineering::Chemical engineering
Online Access:http://hdl.handle.net/10356/6969
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Institution: Nanyang Technological University
id sg-ntu-dr.10356-6969
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spelling sg-ntu-dr.10356-69692023-03-04T18:07:25Z Reaction micro- and nano-imprint lithography with polymers Chan, Mary Bee Eng. School of Mechanical and Production Engineering DRNTU::Engineering::Chemical engineering The objectives of the proposed Project are as follows: a) Development of High Aspect Ratio Micro- and Nano-Imprint Lithography for patterning over large surface areas. b) Development of soft-on-hard mold technology as an enabling technology for low pressure molding of high aspect ratio polymeric micro-structures and nano-structures. c) Development of ultrathin polymer film coating or grafting for release application. d) Development of novel release coating with good release and durability. 2008-09-17T14:38:20Z 2008-09-17T14:38:20Z 2004 2004 Research Report http://hdl.handle.net/10356/6969 Nanyang Technological University application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
topic DRNTU::Engineering::Chemical engineering
spellingShingle DRNTU::Engineering::Chemical engineering
Chan, Mary Bee Eng.
Reaction micro- and nano-imprint lithography with polymers
description The objectives of the proposed Project are as follows: a) Development of High Aspect Ratio Micro- and Nano-Imprint Lithography for patterning over large surface areas. b) Development of soft-on-hard mold technology as an enabling technology for low pressure molding of high aspect ratio polymeric micro-structures and nano-structures. c) Development of ultrathin polymer film coating or grafting for release application. d) Development of novel release coating with good release and durability.
author2 School of Mechanical and Production Engineering
author_facet School of Mechanical and Production Engineering
Chan, Mary Bee Eng.
format Research Report
author Chan, Mary Bee Eng.
author_sort Chan, Mary Bee Eng.
title Reaction micro- and nano-imprint lithography with polymers
title_short Reaction micro- and nano-imprint lithography with polymers
title_full Reaction micro- and nano-imprint lithography with polymers
title_fullStr Reaction micro- and nano-imprint lithography with polymers
title_full_unstemmed Reaction micro- and nano-imprint lithography with polymers
title_sort reaction micro- and nano-imprint lithography with polymers
publishDate 2008
url http://hdl.handle.net/10356/6969
_version_ 1759854821817450496

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