Characterization of nanoscale conducting filament in high-k oxides by scanning tunneling microscopy and conductive atomic force microscopy

By virtue of its simple structure, high operating speed and scalability, the resistive memory or RRAM is deemed a promising alternative to the charge-based memory, which is now facing severe scaling challenges. Of particular interest is the HfO2 RRAM due to its immediate compatibility with mainstrea...

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Bibliographic Details
Main Author: Zhou, Yu
Other Authors: Ang Diing Shenp
Format: Theses and Dissertations
Language:English
Published: 2017
Subjects:
Online Access:http://hdl.handle.net/10356/72747
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Institution: Nanyang Technological University
Language: English