Flatness and warpage measurement of semiconductor wafers

The advancement in technology has led to the rise of a form of non-contact three-dimensional optical metrology system known as Phase Measuring Deflectometer (PMD). The ability of the system to perform a non-destructive measurement of high accuracy and high speed at a lower cost in contrast to the tr...

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Main Author: Ang, Mun Ru
Other Authors: Anand Krishna Asundi
Format: Final Year Project
Language:English
Published: 2019
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Online Access:http://hdl.handle.net/10356/78600
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-786002023-03-04T18:37:43Z Flatness and warpage measurement of semiconductor wafers Ang, Mun Ru Anand Krishna Asundi School of Mechanical and Aerospace Engineering DRNTU::Engineering::Mechanical engineering The advancement in technology has led to the rise of a form of non-contact three-dimensional optical metrology system known as Phase Measuring Deflectometer (PMD). The ability of the system to perform a non-destructive measurement of high accuracy and high speed at a lower cost in contrast to the traditional system has resulted in an increasing demand for such a product. This report presents the evaluation of 3 types of existing PMD system in the laboratory with the aim of developing the existing PMD system into a commercialised product. These 3 systems are a Stereoscopic PMD system and 2 single cameras vertical PMD system of medium and small size. This evaluation stems from the understanding of the PMD principle and operation of the existing PMD system derived from the testing and experimental process. Mirror lens was tested in place of a wafer as a result of the need to understand the characteristics of the mirror lens as well as the ability of the system in measuring those characteristics. This evaluation served as the basis for the development of the design of a commercialised PMD system. All design presented in this report can be categorized into 2 forms, namely the development of the design to improve on the existing system as well as the development of an entirely new design. A simplified version of the prototype is then created after the evaluation of the developed design based on cost and how critical is a particular component to the design overall function. All design developed in this project will not be able to be fully pursued at this stage due to the cost constraint. Thus, a recommendation on the development or the creation of the developed design is presented towards the end of the report. Bachelor of Engineering (Mechanical Engineering) 2019-06-24T05:53:56Z 2019-06-24T05:53:56Z 2019 Final Year Project (FYP) http://hdl.handle.net/10356/78600 en Nanyang Technological University 72 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Mechanical engineering
spellingShingle DRNTU::Engineering::Mechanical engineering
Ang, Mun Ru
Flatness and warpage measurement of semiconductor wafers
description The advancement in technology has led to the rise of a form of non-contact three-dimensional optical metrology system known as Phase Measuring Deflectometer (PMD). The ability of the system to perform a non-destructive measurement of high accuracy and high speed at a lower cost in contrast to the traditional system has resulted in an increasing demand for such a product. This report presents the evaluation of 3 types of existing PMD system in the laboratory with the aim of developing the existing PMD system into a commercialised product. These 3 systems are a Stereoscopic PMD system and 2 single cameras vertical PMD system of medium and small size. This evaluation stems from the understanding of the PMD principle and operation of the existing PMD system derived from the testing and experimental process. Mirror lens was tested in place of a wafer as a result of the need to understand the characteristics of the mirror lens as well as the ability of the system in measuring those characteristics. This evaluation served as the basis for the development of the design of a commercialised PMD system. All design presented in this report can be categorized into 2 forms, namely the development of the design to improve on the existing system as well as the development of an entirely new design. A simplified version of the prototype is then created after the evaluation of the developed design based on cost and how critical is a particular component to the design overall function. All design developed in this project will not be able to be fully pursued at this stage due to the cost constraint. Thus, a recommendation on the development or the creation of the developed design is presented towards the end of the report.
author2 Anand Krishna Asundi
author_facet Anand Krishna Asundi
Ang, Mun Ru
format Final Year Project
author Ang, Mun Ru
author_sort Ang, Mun Ru
title Flatness and warpage measurement of semiconductor wafers
title_short Flatness and warpage measurement of semiconductor wafers
title_full Flatness and warpage measurement of semiconductor wafers
title_fullStr Flatness and warpage measurement of semiconductor wafers
title_full_unstemmed Flatness and warpage measurement of semiconductor wafers
title_sort flatness and warpage measurement of semiconductor wafers
publishDate 2019
url http://hdl.handle.net/10356/78600
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