Electron beam lithography for nanofabrication
Electron beam lithography has consolidated as one of the most common techniques for patterning at the nanoscale range. It has enabled the nanofabrication of structures and devices within the research field of nanotechnology and nanoscience. The use of EBL for the development of a wide range of na...
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| Format: | Theses and Dissertations |
| Language: | English |
| Published: |
2019
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| Online Access: | http://hdl.handle.net/10356/78660 |
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| Institution: | Nanyang Technological University |
| Language: | English |
| Summary: | Electron beam lithography has consolidated as one of the most common techniques
for patterning at the nanoscale range. It has enabled the nanofabrication of structures
and devices within the research field of nanotechnology and nanoscience. The use of
EBL for the development of a wide range of nanostructures and nanodevices has been
and will continue to be crucial for the application of discrete devices for fundamental
research. EBL has advantages in its high resolution, flexibility, and compatibility with
other conventional fabrication processes. The purpose of this thesis is to learn the
operation process of the EBL tool and apply EBL in the area of nanofabrication. A
standard set of processes has been determined and presented in this project. EBL is a complex process with many interacting parameters that affect the quality of the performance result in nanofabricated structures. An approach has summarized the key principles of EBL and explores some structures with relevant parameters through Raith EBPG 5200 tool. |
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