Electron beam lithography for nanofabrication

• Main Author: Zhou, Jin
• Other Authors: Wang Hong
• Format: Theses and Dissertations
• Language: English
• Published: 2019
• Subjects: Engineering::Electrical and electronic engineering::Nanoelectronics
• Online Access: http://hdl.handle.net/10356/78660
• Institution: Nanyang Technological University

Electron beam lithography has consolidated as one of the most common techniques for patterning at the nanoscale range. It has enabled the nanofabrication of structures and devices within the research field of nanotechnology and nanoscience. The use of EBL for the development of a wide range of nanostructures and nanodevices has been and will continue to be crucial for the application of discrete devices for fundamental research. EBL has advantages in its high resolution, flexibility, and compatibility with other conventional fabrication processes. The purpose of this thesis is to learn the operation process of the EBL tool and apply EBL in the area of nanofabrication. A standard set of processes has been determined and presented in this project. EBL is a complex process with many interacting parameters that affect the quality of the performance result in nanofabricated structures. An approach has summarized the key principles of EBL and explores some structures with relevant parameters through Raith EBPG 5200 tool.