Electron beam lithography for nanofabrication
Electron beam lithography has consolidated as one of the most common techniques for patterning at the nanoscale range. It has enabled the nanofabrication of structures and devices within the research field of nanotechnology and nanoscience. The use of EBL for the development of a wide range of na...
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| Format: | Theses and Dissertations |
| Language: | English |
| Published: |
2019
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| Online Access: | http://hdl.handle.net/10356/78660 |
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| Institution: | Nanyang Technological University |
| Language: | English |
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