Grid-based simulation of industrial thin-film production

• Main Authors: Krzhizhanovskaya, Valeria V., Sloot, Peter M. A., Gorbachev, Yu. E.
• Other Authors: School of Computer Engineering
• Format: Article
• Language: English
• Published: 2013
• Online Access: https://hdl.handle.net/10356/84460; http://hdl.handle.net/10220/10144
• Institution: Nanyang Technological University

In this article, the authors introduce a Grid-based virtual reactor, a High Level Architecture (HLA)- supported problem-solving environment that allows for detailed numerical study of industrial thin-film production in plasma-enhanced chemical vapor deposition (PECVD) reactors. They briefly describe the physics and chemistry underpinning the deposition process, the numerical approach to simulate these processes on advanced computer architectures, and the associated software environment supporting computational experiments. The authors built an efficient problem-solving environment for scientists studying PECVD processes and end users working in the chemical industry and validated the resulting virtual reactor against real experiments.