Grid-based simulation of industrial thin-film production
In this article, the authors introduce a Grid-based virtual reactor, a High Level Architecture (HLA)- supported problem-solving environment that allows for detailed numerical study of industrial thin-film production in plasma-enhanced chemical vapor deposition (PECVD) reactors. They briefly describe...
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| Main Authors: | , , |
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| Other Authors: | |
| Format: | Article |
| Language: | English |
| Published: |
2013
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| Online Access: | https://hdl.handle.net/10356/84460 http://hdl.handle.net/10220/10144 |
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| Institution: | Nanyang Technological University |
| Language: | English |