Epitaxial BiFeO3 thin films on Si

BiFeO3 was studied as an alternative environmentally clean ferro/piezoelectric material. 200-nm-thick BiFeO3 films were grown on Si substrates with SrTiO3 as a template layer and SrRuO3 as bottom electrode. X-ray and transmission electron...

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Main Authors:	Droopad, R., Yu, J., Wang, J., Zheng, H., Ma, Z., Prasertchoung, S., Wuttig, M., Eisenbeiser, K., Ramesh, R.
Other Authors:	School of Materials Science & Engineering
Format:	Article
Language:	English
Published:	2011
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Online Access:	https://hdl.handle.net/10356/85279 http://hdl.handle.net/10220/6902
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Institution:	Nanyang Technological University
Language:	English

id	sg-ntu-dr.10356-85279
record_format	dspace
spelling	sg-ntu-dr.10356-852792023-07-14T15:45:33Z Epitaxial BiFeO3 thin films on Si Droopad, R. Yu, J. Wang, J. Zheng, H. Ma, Z. Prasertchoung, S. Wuttig, M. Eisenbeiser, K. Ramesh, R. School of Materials Science & Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics BiFeO3 was studied as an alternative environmentally clean ferro/piezoelectric material. 200-nm-thick BiFeO3 films were grown on Si substrates with SrTiO3 as a template layer and SrRuO3 as bottom electrode. X-ray and transmission electron microscopy studies confirmed the epitaxial growth of the films. The spontaneous polarization of the films was ~45μC/cm2. Retention measurement up to several days showed no decay of polarization. A piezoelectric coefficient (d33) of ~60 pm/V was observed, which is promising for applications in micro-electro-mechanical systems and actuators. Published version 2011-07-14T03:47:22Z 2019-12-06T16:00:49Z 2011-07-14T03:47:22Z 2019-12-06T16:00:49Z 2004 2004 Journal Article Wang, J., Zheng, H., Ma, Z., Prasertchoung, S., Wuttig, M., Droopad, R., et al. (2004). Epitaxial BiFeO3 Thin Films on Si. Applied Physics Letters, 85(13), 2574-2576. https://hdl.handle.net/10356/85279 http://hdl.handle.net/10220/6902 10.1063/1.1799234 en Applied physics letters © 2004 American Institute of Physics. This paper was published in Applied Physics Letters and is made available as an electronic reprint (preprint) with permission of American Institute of Physics. The paper can be found at the following DOI: http://dx.doi.org/10.1063/1.1799234. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. 3 p. application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
language	English
topic	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics Droopad, R. Yu, J. Wang, J. Zheng, H. Ma, Z. Prasertchoung, S. Wuttig, M. Eisenbeiser, K. Ramesh, R. Epitaxial BiFeO3 thin films on Si
description	BiFeO3 was studied as an alternative environmentally clean ferro/piezoelectric material. 200-nm-thick BiFeO3 films were grown on Si substrates with SrTiO3 as a template layer and SrRuO3 as bottom electrode. X-ray and transmission electron microscopy studies confirmed the epitaxial growth of the films. The spontaneous polarization of the films was ~45μC/cm2. Retention measurement up to several days showed no decay of polarization. A piezoelectric coefficient (d33) of ~60 pm/V was observed, which is promising for applications in micro-electro-mechanical systems and actuators.
author2	School of Materials Science & Engineering
author_facet	School of Materials Science & Engineering Droopad, R. Yu, J. Wang, J. Zheng, H. Ma, Z. Prasertchoung, S. Wuttig, M. Eisenbeiser, K. Ramesh, R.
format	Article
author	Droopad, R. Yu, J. Wang, J. Zheng, H. Ma, Z. Prasertchoung, S. Wuttig, M. Eisenbeiser, K. Ramesh, R.
author_sort	Droopad, R.
title	Epitaxial BiFeO3 thin films on Si
title_short	Epitaxial BiFeO3 thin films on Si
title_full	Epitaxial BiFeO3 thin films on Si
title_fullStr	Epitaxial BiFeO3 thin films on Si
title_full_unstemmed	Epitaxial BiFeO3 thin films on Si
title_sort	epitaxial bifeo3 thin films on si
publishDate	2011
url	https://hdl.handle.net/10356/85279 http://hdl.handle.net/10220/6902
_version_	1772828741661097984

Epitaxial BiFeO3 thin films on Si

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