Phase shift reflectometry for wafer inspection

In 3D measurement, specular surfaces can be reconstructed by phase shift reflectometry and the system configuration is simple. In this paper, a wafer is measured for industrial inspection to make sure the quality of the wafer by calibrating, phase unwrapping, slope calculation and integration. The p...

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Main Authors: Peng, Kuang, Cao, Yiping, Li, Hongru, Sun, Jianfei, Bourgade, Thomas, Asundi, Anand Krishna
其他作者: Asundi, Anand K.
格式: Conference or Workshop Item
語言:English
出版: 2018
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在線閱讀:https://hdl.handle.net/10356/89019
http://hdl.handle.net/10220/47013
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