Phase shift reflectometry for wafer inspection

• المؤلفون الرئيسيون: Peng, Kuang, Cao, Yiping, Li, Hongru, Sun, Jianfei, Bourgade, Thomas, Asundi, Anand Krishna
• مؤلفون آخرون: Asundi, Anand K.
• التنسيق: Conference or Workshop Item
• اللغة: English
• منشور في: 2018
• الموضوعات: Phase Shift Reflectometry; DRNTU::Engineering::Mechanical engineering; Specular Surface
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/89019; http://hdl.handle.net/10220/47013
• المؤسسة: Nanyang Technological University

In 3D measurement, specular surfaces can be reconstructed by phase shift reflectometry and the system configuration is simple. In this paper, a wafer is measured for industrial inspection to make sure the quality of the wafer by calibrating, phase unwrapping, slope calculation and integration. The p...