Mathematical model of low-temperature wafer bonding under medium vacuum and its application

Low-temperature direct wafer bonding was successfully performed under medium vacuum level. A mathematical model was developed based on the qualitative understanding of the bonding mechanisms. The model combined the diffusion-reaction model of water in SiO2 and the diffusion theory in porous media. I...

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Bibliographic Details
Main Authors: Yu, Weibo, Wei, Jun, Tan, Cher Ming, Huang, Guang Yu
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2009
Subjects:
Online Access:https://hdl.handle.net/10356/90757
http://hdl.handle.net/10220/5336
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Institution: Nanyang Technological University
Language: English
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