A voltage scalable 0.26 V, 64 kb 8T SRAM with Vmin lowering techniques and deep sleep mode

A voltage scalable 0.26 V, 64 kb 8T SRAM with 512 cells per bitline is implemented in a 130 nm CMOS process. Utilization of the reverse short channel effect in a SRAM cell design improves cell write margin and read performance without the aid of peripheral circuits. A marginal bitline leakage compen...

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Bibliographic Details
Main Authors: Kim, Tony Tae-Hyoung, Liu, Jason., Kim, Chris H.
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2010
Subjects:
Online Access:https://hdl.handle.net/10356/90787
http://hdl.handle.net/10220/6309
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Institution: Nanyang Technological University
Language: English
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