A voltage scalable 0.26 V, 64 kb 8T SRAM with Vmin lowering techniques and deep sleep mode
A voltage scalable 0.26 V, 64 kb 8T SRAM with 512 cells per bitline is implemented in a 130 nm CMOS process. Utilization of the reverse short channel effect in a SRAM cell design improves cell write margin and read performance without the aid of peripheral circuits. A marginal bitline leakage compen...
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Main Authors: | Kim, Tony Tae-Hyoung, Liu, Jason., Kim, Chris H. |
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Other Authors: | School of Electrical and Electronic Engineering |
Format: | Article |
Language: | English |
Published: |
2010
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/90787 http://hdl.handle.net/10220/6309 |
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Institution: | Nanyang Technological University |
Language: | English |
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