Profile of optical constants of SiO2 thin films containing Si nanocrystals
For optoelectronic and photonic applications of Si nanocrystals (nc-Si) embedded in a SiO2 matrix, the information of the depth profiles of the optical constants for the thin film system is necessary. In this work, an approach of the depth profiling for the thin film synthesized with ion implantatio...
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Main Authors: | , , , , |
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Other Authors: | |
Format: | Article |
Language: | English |
Published: |
2010
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/90789 http://hdl.handle.net/10220/6412 |
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Institution: | Nanyang Technological University |
Language: | English |
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