Profile of optical constants of SiO2 thin films containing Si nanocrystals

• المؤلفون الرئيسيون: Dong, Gui, Chen, Tupei, Liu, Yang, Tse, Man Siu, Fung, Stevenson Hon Yuen
• مؤلفون آخرون: School of Electrical and Electronic Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2010
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/90789; http://hdl.handle.net/10220/6412

For optoelectronic and photonic applications of Si nanocrystals (nc-Si) embedded in a SiO2 matrix, the information of the depth profiles of the optical constants for the thin film system is necessary. In this work, an approach of the depth profiling for the thin film synthesized with ion implantatio...