Determining the location of localized defect in the perpendicular junction configuration with the use of electron beam induced current

This paper describes a new method of determining the location of a localized defect in semiconductor materials using the perpendicular p–n junction configuration. The scanning electron microscope (SEM) operating in the charge-collection, or the electron beam induced current (EBIC) mode, is used f...

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書目詳細資料
Main Authors: Phua, Poh Chin., Ong, Vincent K. S.
其他作者: School of Electrical and Electronic Engineering
格式: Article
語言:English
出版: 2009
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在線閱讀:https://hdl.handle.net/10356/90974
http://hdl.handle.net/10220/4650
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機構: Nanyang Technological University
語言: English