Determining the location of localized defect in the perpendicular junction configuration with the use of electron beam induced current
This paper describes a new method of determining the location of a localized defect in semiconductor materials using the perpendicular p–n junction configuration. The scanning electron microscope (SEM) operating in the charge-collection, or the electron beam induced current (EBIC) mode, is used f...
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Main Authors: | , |
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格式: | Article |
語言: | English |
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2009
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在線閱讀: | https://hdl.handle.net/10356/90974 http://hdl.handle.net/10220/4650 |
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機構: | Nanyang Technological University |
語言: | English |