Metallization proximity studies for copper spiral inductors on silicon

The impacts of metallization proximity for copper spiral inductors on silicon have been investigated in this paper. Performance of the spiral inductor versus area consumption tradeoff with respect to its core diameter is evaluated quantitatively for the first time. Effects of the inductor’s proxi...

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Main Authors:	Sia, Choon Beng, Yeo, Kiat Seng, Do, Manh Anh, Ma, Jianguo
Other Authors:	School of Electrical and Electronic Engineering
Format:	Article
Language:	English
Published:	2009
Subjects:	DRNTU::Engineering::Electrical and electronic engineering
Online Access:	https://hdl.handle.net/10356/91040 http://hdl.handle.net/10220/6016
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Institution:	Nanyang Technological University
Language:	English

id	sg-ntu-dr.10356-91040
record_format	dspace
spelling	sg-ntu-dr.10356-910402020-03-07T13:56:09Z Metallization proximity studies for copper spiral inductors on silicon Sia, Choon Beng Yeo, Kiat Seng Do, Manh Anh Ma, Jianguo School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering The impacts of metallization proximity for copper spiral inductors on silicon have been investigated in this paper. Performance of the spiral inductor versus area consumption tradeoff with respect to its core diameter is evaluated quantitatively for the first time. Effects of the inductor’s proximate grounded metallization on its overall inductive performance are also analyzed. Published version 2009-08-03T06:02:34Z 2019-12-06T17:58:39Z 2009-08-03T06:02:34Z 2019-12-06T17:58:39Z 2003 2003 Journal Article Sia, C. B., Yeo, K. S., Do, M. A., & Ma, J. G. (2003). Metallization proximity studies for copper spiral inductors on silicon. IEEE Transactions on Semiconductor Manufacturing, 16(2), 220-227. 0894-6507 https://hdl.handle.net/10356/91040 http://hdl.handle.net/10220/6016 10.1109/TSM.2003.811574 en IEEE transactions on semiconductor manufacturing IEEE Transactions on Semiconductor Manufacturing © 2003 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder. http://www.ieee.org/portal/site. 8 p. application/pdf
institution	Nanyang Technological University
building	NTU Library
country	Singapore
collection	DR-NTU
language	English
topic	DRNTU::Engineering::Electrical and electronic engineering
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering Sia, Choon Beng Yeo, Kiat Seng Do, Manh Anh Ma, Jianguo Metallization proximity studies for copper spiral inductors on silicon
description	The impacts of metallization proximity for copper spiral inductors on silicon have been investigated in this paper. Performance of the spiral inductor versus area consumption tradeoff with respect to its core diameter is evaluated quantitatively for the first time. Effects of the inductor’s proximate grounded metallization on its overall inductive performance are also analyzed.
author2	School of Electrical and Electronic Engineering
author_facet	School of Electrical and Electronic Engineering Sia, Choon Beng Yeo, Kiat Seng Do, Manh Anh Ma, Jianguo
format	Article
author	Sia, Choon Beng Yeo, Kiat Seng Do, Manh Anh Ma, Jianguo
author_sort	Sia, Choon Beng
title	Metallization proximity studies for copper spiral inductors on silicon
title_short	Metallization proximity studies for copper spiral inductors on silicon
title_full	Metallization proximity studies for copper spiral inductors on silicon
title_fullStr	Metallization proximity studies for copper spiral inductors on silicon
title_full_unstemmed	Metallization proximity studies for copper spiral inductors on silicon
title_sort	metallization proximity studies for copper spiral inductors on silicon
publishDate	2009
url	https://hdl.handle.net/10356/91040 http://hdl.handle.net/10220/6016
_version_	1681046111383453696

Metallization proximity studies for copper spiral inductors on silicon

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