Nanolithography of single-layer graphene oxide films by atomic force microscopy

• Main Authors: Lu, Gang, Zhou, Xiaozhu, Li, Hai, Yin, Zongyou, Li, Bing, Huang, Ling, Boey, Freddy Yin Chiang, Zhang, Hua
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2012
• Subjects: DRNTU::Engineering::Materials
• Online Access: https://hdl.handle.net/10356/94306; http://hdl.handle.net/10220/8603
• Institution: Nanyang Technological University

Atomic force microscopy-based nanolithography is used to generate the single-layer graphene oxide (GO) patterns on Si/SiO2 substrates. In this process, a Si tip is used to scratch GO films, resulting in GO-free trenches. Using this method, various single-layer GO patterns such as gaps, ribbons, squares, triangles, and zigzags can be easily fabricated. By using the GO patterns as templates, the hybrid GO-Ag nanoparticle patterns were obtained. Our study provides a flexible, simple, convenient method for generating GO patterns on solid substrates, which could be useful for graphene material-based device applications.