Silicide formation from laser thermal processing of Ti/Co bilayers

• Main Authors: Chow, F. L., Pey, Kin Leong, Lee, Pooi See, Tung, Chih Hang, Wang, X. C., Lim, G. C., Chong, Y. F.
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2012
• Subjects: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials
• Online Access: https://hdl.handle.net/10356/94699; http://hdl.handle.net/10220/8094
• Institution: Nanyang Technological University

A bilayered CoTi silicide structure consisting of an amorphous CoTi silicide and a highly textured CoTi silicide was found after pulsed excimer laser annealing of titanium/cobalt/silicon stack at high fluence of 0.6 J/cm2. The highly textured CoTi silicide is monocrysta...