Crystallization and surface texturing of amorphous-Si induced by UV laser for photovoltaic application

• المؤلفون الرئيسيون: Hong, Lei, Wang, Xincai, Rusli, Wang, Hao, Zheng, Hongyu, Yu, Hongyu
• مؤلفون آخرون: School of Electrical and Electronic Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2013
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/95246; http://hdl.handle.net/10220/9132

The DPSS Nd:YVO4 UV laser is used to anneal amorphous silicon (a-Si) film to achieve crystallization and nano-dome surface texturing simultaneously in a one-step annealing process. With pulse energy of 380 mJ/cm2 and repetition rate of 20 kHz, the a-Si can be crystallized by the sequential lateral s...