Effect of oxygen concentration on the thermal stability of magnetron sputtered amorphous Ta–Ni thin films

• Main Authors: Yan, Hua, Santoso, Raissa Nathania, Jiang, Yueyue, Liang, Meng Heng, Chen, Zhong
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2013
• Online Access: https://hdl.handle.net/10356/96368; http://hdl.handle.net/10220/10282
• Institution: Nanyang Technological University

The effect of oxygen concentration on the thermal stability of amorphous Ta–Ni thin film alloy is studied in this work. The films were deposited on Si substrates by co-sputtering of Ta and Ni targets. The oxygen concentration in the Ta–Ni films was controlled by applying radio frequency (RF) substra...