Copper diffusion barrier performance of amorphous Ta-Ni thin films

Amorphous Ta–Ni thin films were deposited on Si substrate by magnetron sputtering. The oxygen concentration was adjusted by controlling the substrate bias during the sputtering deposition. Two types of Ta–Ni films, namely Ta67.34Ni27.06O5.60 and Ta73.25Ni26.10O0.65 were employed in the current study...

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Bibliographic Details
Main Authors: Yan, Hua, Tay, Yee Yan, Jiang, Yueyue, Yantara, Natalia, Pan, Jisheng, Liang, Meng Heng, Chen, Zhong
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2013
Online Access:https://hdl.handle.net/10356/100648
http://hdl.handle.net/10220/11040
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Institution: Nanyang Technological University
Language: English