Evaluation of substrate bias effect on Ta-Ni thin film as Cu diffusion barrier
This work examines the thin film properties and diffusion barrier performance of magnetron-sputtered Ta-Ni films. The thin films were deposited on Si substrate with varying RF substrate bias, aiming at depositing highly thermally stable amorphous and conductive diffusion barriers for copper metalliz...
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| Format: | Final Year Project |
| Language: | English |
| Published: |
2009
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| Online Access: | http://hdl.handle.net/10356/15409 |
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| Institution: | Nanyang Technological University |
| Language: | English |