Evaluation of substrate bias effect on Ta-Ni thin film as Cu diffusion barrier

• Main Author: Jiang, Yueyue
• Other Authors: Chen, Zhong
• Format: Final Year Project
• Language: English
• Published: 2009
• Subjects: DRNTU::Engineering
• Online Access: http://hdl.handle.net/10356/15409
• Institution: Nanyang Technological University

This work examines the thin film properties and diffusion barrier performance of magnetron-sputtered Ta-Ni films. The thin films were deposited on Si substrate with varying RF substrate bias, aiming at depositing highly thermally stable amorphous and conductive diffusion barriers for copper metalliz...