The use of sample rotation in SIMS profiling of Ta barrier layers to Cu diffusion

The use of sample rotation in SIMS profiling of Ta barrier layers to Cu diffusion

10.1117/12.405375

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Bibliographic Details
Main Authors: Liu, R., Wee, A.T.S., Liu, L., Hao, G.
Other Authors: MATERIALS SCIENCE
Format: Conference or Workshop Item
Published: 2014
Subjects:
Cu metallization
Sample rotation
Secondary ion mass spectrometry
Ta barriers
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113122
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/113122

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