SIMS backside depth profiling of ultra shallow implants

SIMS backside depth profiling of ultra shallow implants

10.1016/S0169-4332(02)00671-2

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Bibliographic Details
Main Authors: Yeo, K.L., Wee, A.T.S., See, A., Liu, R., Ng, C.M.
Other Authors: INSTITUTE OF ENGINEERING SCIENCE
Format: Conference or Workshop Item
Published: 2014
Subjects:
Backside SIMS
Oxygen flooding
Sample rotation
Secondary ion mass spectrometry
Ultra shallow implants
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113117
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/113117

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