SIMS backside depth profiling of ultra shallow implants

10.1016/S0169-4332(02)00671-2

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Bibliographic Details
Main Authors:	Yeo, K.L., Wee, A.T.S., See, A., Liu, R., Ng, C.M.
Other Authors:	INSTITUTE OF ENGINEERING SCIENCE
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Backside SIMS Oxygen flooding Sample rotation Secondary ion mass spectrometry Ultra shallow implants
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/113117
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Institution:	National University of Singapore

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