SIMS backside depth profiling of ultra shallow implants
10.1016/S0169-4332(02)00671-2
Saved in:
Main Authors: | Yeo, K.L., Wee, A.T.S., See, A., Liu, R., Ng, C.M. |
---|---|
Other Authors: | INSTITUTE OF ENGINEERING SCIENCE |
Format: | Conference or Workshop Item |
Published: |
2014
|
Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/113117 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
SIMS backside depth profiling of ultrashallow implants using silicon-on-insulator substrates
by: Yeo, K.L., et al.
Published: (2014) -
High resolution backside SIMS depth profiling
by: YEO KWEE LIANG
Published: (2010) -
Sub-keV secondary ion mass spectrometry depth profiling: Comparison of sample rotation and oxygen flooding
by: Liu, R., et al.
Published: (2014) -
Ultra shallow depth profiling of B deltas in Si using a CAMECA IMS 6f
by: Ng, C.M., et al.
Published: (2014) -
Application of excimer laser annealing in the formation of ultra-shallow p+/n junctions
by: Chong, Y.F., et al.
Published: (2014)