Influence of bias voltage on the hardness and toughness of CrAlN coatings via magnetron sputtering
Chromium aluminum nitride (CrAlN) coatings were prepared via magnetron sputtering in a mixed Ar and N2 ambient. The effect of negative bias voltage (Vb) on the microstructure was investigated using a spectrum of characterizing techniques in terms of Glancing Angle X-ray Diffractometry, Field Emissio...
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sg-ntu-dr.10356-965812020-03-07T12:34:42Z Influence of bias voltage on the hardness and toughness of CrAlN coatings via magnetron sputtering Lee, Jyh-Wei Lew, Wen Siang Li, Bo Zhang, Sam Wang, Yu Xi School of Mechanical and Aerospace Engineering School of Physical and Mathematical Sciences Chromium aluminum nitride (CrAlN) coatings were prepared via magnetron sputtering in a mixed Ar and N2 ambient. The effect of negative bias voltage (Vb) on the microstructure was investigated using a spectrum of characterizing techniques in terms of Glancing Angle X-ray Diffractometry, Field Emission Scanning Electron Microscopy and Transmission Electron Microscopy. As Vb increased from 50 to 260 V, hardness was improved from 10 to 26 GPa. Toughness grew at the same time and maximized at around 2 MPa·m1/2 when Vb = 210 V. Simultaneous improvements in hardness and toughness were attributed to the densified microstructure with refined grains and increased compressive stress. 2013-06-13T03:05:10Z 2019-12-06T19:32:44Z 2013-06-13T03:05:10Z 2019-12-06T19:32:44Z 2012 2012 Journal Article Wang, Y. X., Zhang, S., Lee, J.-W., Lew, W. S., & Li, B. (2012). Influence of bias voltage on the hardness and toughness of CrAlN coatings via magnetron sputtering. Surface and Coatings Technology, 206(24), 5103-5107. 0257-8972 https://hdl.handle.net/10356/96581 http://hdl.handle.net/10220/10302 10.1016/j.surfcoat.2012.06.041 en Surface and coatings technology © 2012 Elsevier B.V. |
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Chromium aluminum nitride (CrAlN) coatings were prepared via magnetron sputtering in a mixed Ar and N2 ambient. The effect of negative bias voltage (Vb) on the microstructure was investigated using a spectrum of characterizing techniques in terms of Glancing Angle X-ray Diffractometry, Field Emission Scanning Electron Microscopy and Transmission Electron Microscopy. As Vb increased from 50 to 260 V, hardness was improved from 10 to 26 GPa. Toughness grew at the same time and maximized at around 2 MPa·m1/2 when Vb = 210 V. Simultaneous improvements in hardness and toughness were attributed to the densified microstructure with refined grains and increased compressive stress. |
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School of Mechanical and Aerospace Engineering |
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School of Mechanical and Aerospace Engineering Lee, Jyh-Wei Lew, Wen Siang Li, Bo Zhang, Sam Wang, Yu Xi |
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Lee, Jyh-Wei Lew, Wen Siang Li, Bo Zhang, Sam Wang, Yu Xi |
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Lee, Jyh-Wei Lew, Wen Siang Li, Bo Zhang, Sam Wang, Yu Xi Influence of bias voltage on the hardness and toughness of CrAlN coatings via magnetron sputtering |
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Lee, Jyh-Wei |
title |
Influence of bias voltage on the hardness and toughness of CrAlN coatings via magnetron sputtering |
title_short |
Influence of bias voltage on the hardness and toughness of CrAlN coatings via magnetron sputtering |
title_full |
Influence of bias voltage on the hardness and toughness of CrAlN coatings via magnetron sputtering |
title_fullStr |
Influence of bias voltage on the hardness and toughness of CrAlN coatings via magnetron sputtering |
title_full_unstemmed |
Influence of bias voltage on the hardness and toughness of CrAlN coatings via magnetron sputtering |
title_sort |
influence of bias voltage on the hardness and toughness of craln coatings via magnetron sputtering |
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2013 |
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https://hdl.handle.net/10356/96581 http://hdl.handle.net/10220/10302 |
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