Ni(Pt) alloy silicidation on (100) Si and poly-silicon lines

The roles of the Pt in Ni-(5 at.% Pt) alloy reaction on narrow c-Si (100) and polysilicon (poly-Si) lines by rapid thermal annealed (RTP) in the range of 400 to 900 °C were studied. By the addition of Pt as an alloying element, the phase stability of NiSi on Si(100) was enhanced and the retardation...

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Bibliographic Details
Main Authors: Pey, Kin Leong, Lee, Pooi See, Mangelinck, D.
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2013
Subjects:
Online Access:https://hdl.handle.net/10356/97213
http://hdl.handle.net/10220/10478
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Institution: Nanyang Technological University
Language: English