Phase and layer stability of Ni- and Ni(Pt)-silicides on narrow poly-Si lines

• Main Authors: Mangelinck, D., Dai, J. Y., Chan, L., Ding, Jun, Chi, Dong Zhi, Lee, Pooi See, Pey, Kin Leong
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2012
• Subjects: DRNTU::Engineering::Materials
• Online Access: https://hdl.handle.net/10356/101406; http://hdl.handle.net/10220/8059
• Institution: Nanyang Technological University

The phase and morphology stability of NiSi and Ni(Pt)Si formed on the poly-Si lines and wide pads have been studied. Differences in the NiSi2 nucleation temperature and the extent of layer inversion have been analyzed. The nucleation of NiSi2 was hindered on the narrow poly-Si lines a...