Phase and layer stability of Ni- and Ni(Pt)-silicides on narrow poly-Si lines

• المؤلفون الرئيسيون: Mangelinck, D., Dai, J. Y., Chan, L., Ding, Jun, Chi, Dong Zhi, Lee, Pooi See, Pey, Kin Leong
• مؤلفون آخرون: School of Materials Science & Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2012
• الموضوعات: DRNTU::Engineering::Materials
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/101406; http://hdl.handle.net/10220/8059
• المؤسسة: Nanyang Technological University

The phase and morphology stability of NiSi and Ni(Pt)Si formed on the poly-Si lines and wide pads have been studied. Differences in the NiSi2 nucleation temperature and the extent of layer inversion have been analyzed. The nucleation of NiSi2 was hindered on the narrow poly-Si lines a...