On the Ni–Si phase transformation with/without native oxide

• Main Authors: Mangelinck, D., Dai, J. Y., Ho, C. S., See, A., Lee, Pooi See, Pey, Kin Leong, Ding, Jun
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2013
• Online Access: https://hdl.handle.net/10356/97283; http://hdl.handle.net/10220/10540
• Institution: Nanyang Technological University

This study has been carried out to check the effect of native oxide on the formation of Ni silicides. Ni films of various thickness were sputter deposited on Si(100) wafer without oxide, with native oxide and with oxide grown by rapid thermal oxidation, and subjected to rapid thermal annealing in ni...