On the Ni–Si phase transformation with/without native oxide
This study has been carried out to check the effect of native oxide on the formation of Ni silicides. Ni films of various thickness were sputter deposited on Si(100) wafer without oxide, with native oxide and with oxide grown by rapid thermal oxidation, and subjected to rapid thermal annealing in ni...
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| Main Authors: | , , , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | English |
| Published: |
2013
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| Online Access: | https://hdl.handle.net/10356/97283 http://hdl.handle.net/10220/10540 |
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| Institution: | Nanyang Technological University |
| Language: | English |