Ni(Pt) alloy silicidation on (100) Si and poly-silicon lines

The roles of the Pt in Ni-(5 at.% Pt) alloy reaction on narrow c-Si (100) and polysilicon (poly-Si) lines by rapid thermal annealed (RTP) in the range of 400 to 900 °C were studied. By the addition of Pt as an alloying element, the phase stability of NiSi on Si(100) was enhanced and the retardation...

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Main Authors: Pey, Kin Leong, Lee, Pooi See, Mangelinck, D.
其他作者: School of Electrical and Electronic Engineering
格式: Article
語言:English
出版: 2013
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在線閱讀:https://hdl.handle.net/10356/97213
http://hdl.handle.net/10220/10478
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