Thermal effects on LPCVD amorphous silicon

• Main Authors: Lai, M. Z., Lee, Pooi See, Agarwal, Ajay
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2013
• Subjects: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
• Online Access: https://hdl.handle.net/10356/97442; http://hdl.handle.net/10220/10499
• Institution: Nanyang Technological University

The effects of thermal annealing on amorphous silicon deposited using low-pressure chemical vapour deposition (LPCVD) are presented in this paper. The amorphous silicon film is being subjected to different annealing conditions ranging from 600 to 900 °C for a varying period of 30 to 90 min holding t...