Effect of IC layout on the reliability of CMOS amplifiers

• Main Authors: He, Feifei, Tan, Cher Ming
• Other Authors: School of Electrical and Electronic Engineering
• Format: Article
• Language: English
• Published: 2013
• Subjects: DRNTU::Engineering::Electrical and electronic engineering
• Online Access: https://hdl.handle.net/10356/98538; http://hdl.handle.net/10220/11171
• Institution: Nanyang Technological University

With shrinking device size and increasing circuit complexity, interconnect reliability has become the main factor that affects the integrated circuit (IC) reliability. Electromigration (EM) is the major failure mechanism for interconnect reliability. However, little research had been done on the eff...