Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition

• Main Authors: Srinivasan, M. P., Suresh, Vignesh, Huang, Meiyu Stella, Guan, Cao, Fan, Hong Jin, Krishnamoorthy, Sivashankar
• Other Authors: School of Physical and Mathematical Sciences
• Format: Article
• Language: English
• Published: 2013
• Subjects: DRNTU::Science::Chemistry::Organic chemistry::Polymers
• Online Access: https://hdl.handle.net/10356/99169; http://hdl.handle.net/10220/17222
• Institution: Nanyang Technological University

Polymer templates realized through a combination of block copolymer lithography (BCL) and nanoimprint lithography (NIL) are used to direct atomic layer deposition (ALD) to obtain high-quality ZnO nanopatterns. These patterns present a uniform array of ZnO nanostructures with sub-100 nm feature and s...