Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition

10.1021/jp307152s

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Bibliographic Details
Main Authors: Suresh, V., Huang, M.S., Srinivasan, M.P., Guan, C., Fan, H.J., Krishnamoorthy, S.
Other Authors: CHEMICAL & BIOMOLECULAR ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/90052
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Institution: National University of Singapore