Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition

10.1021/jp307152s

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Main Authors: Suresh, V., Huang, M.S., Srinivasan, M.P., Guan, C., Fan, H.J., Krishnamoorthy, S.
Other Authors: CHEMICAL & BIOMOLECULAR ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/90052
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-900522023-10-25T07:47:07Z Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition Suresh, V. Huang, M.S. Srinivasan, M.P. Guan, C. Fan, H.J. Krishnamoorthy, S. CHEMICAL & BIOMOLECULAR ENGINEERING 10.1021/jp307152s Journal of Physical Chemistry C 116 44 23729-23734 2014-10-09T07:00:49Z 2014-10-09T07:00:49Z 2012-11-08 Article Suresh, V., Huang, M.S., Srinivasan, M.P., Guan, C., Fan, H.J., Krishnamoorthy, S. (2012-11-08). Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition. Journal of Physical Chemistry C 116 (44) : 23729-23734. ScholarBank@NUS Repository. https://doi.org/10.1021/jp307152s 19327447 http://scholarbank.nus.edu.sg/handle/10635/90052 000310769300065 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1021/jp307152s
author2 CHEMICAL & BIOMOLECULAR ENGINEERING
author_facet CHEMICAL & BIOMOLECULAR ENGINEERING
Suresh, V.
Huang, M.S.
Srinivasan, M.P.
Guan, C.
Fan, H.J.
Krishnamoorthy, S.
format Article
author Suresh, V.
Huang, M.S.
Srinivasan, M.P.
Guan, C.
Fan, H.J.
Krishnamoorthy, S.
spellingShingle Suresh, V.
Huang, M.S.
Srinivasan, M.P.
Guan, C.
Fan, H.J.
Krishnamoorthy, S.
Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition
author_sort Suresh, V.
title Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition
title_short Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition
title_full Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition
title_fullStr Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition
title_full_unstemmed Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition
title_sort robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/90052
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