Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition
10.1021/jp307152s
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sg-nus-scholar.10635-900522023-10-25T07:47:07Z Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition Suresh, V. Huang, M.S. Srinivasan, M.P. Guan, C. Fan, H.J. Krishnamoorthy, S. CHEMICAL & BIOMOLECULAR ENGINEERING 10.1021/jp307152s Journal of Physical Chemistry C 116 44 23729-23734 2014-10-09T07:00:49Z 2014-10-09T07:00:49Z 2012-11-08 Article Suresh, V., Huang, M.S., Srinivasan, M.P., Guan, C., Fan, H.J., Krishnamoorthy, S. (2012-11-08). Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition. Journal of Physical Chemistry C 116 (44) : 23729-23734. ScholarBank@NUS Repository. https://doi.org/10.1021/jp307152s 19327447 http://scholarbank.nus.edu.sg/handle/10635/90052 000310769300065 Scopus |
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10.1021/jp307152s |
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CHEMICAL & BIOMOLECULAR ENGINEERING |
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CHEMICAL & BIOMOLECULAR ENGINEERING Suresh, V. Huang, M.S. Srinivasan, M.P. Guan, C. Fan, H.J. Krishnamoorthy, S. |
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Suresh, V. Huang, M.S. Srinivasan, M.P. Guan, C. Fan, H.J. Krishnamoorthy, S. |
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Suresh, V. Huang, M.S. Srinivasan, M.P. Guan, C. Fan, H.J. Krishnamoorthy, S. Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition |
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Suresh, V. |
title |
Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition |
title_short |
Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition |
title_full |
Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition |
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Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition |
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Robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition |
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robust, high-density zinc oxide nanoarrays by nanoimprint lithography-assisted area-selective atomic layer deposition |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/90052 |
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