A general lithography-free method of micro/nanoscale fabrication and patterning on Si and Ge surfaces

• Main Authors: Wang, Huatao, Wu, Tom
• Other Authors: School of Physical and Mathematical Sciences
• Format: Article
• Language: English
• Published: 2013
• Online Access: https://hdl.handle.net/10356/99875; http://hdl.handle.net/10220/9189
• Institution: Nanyang Technological University

Here, we introduce and give an overview of a general lithography-free method to fabricate silicide and germanide micro-/nanostructures on Si and Ge surfaces through metal-vapor-initiated endoepitaxial growth. Excellent controls on shape and orientation are achieved by adjusting the substrate orienta...