Polarization behaviors of (Bi 3.15 Nd 0.85) Ti 3 O 12 thin films deposited by radio-frequency magnetron sputtering

Polarization behaviors of (Bi 3.15 Nd 0.85) Ti 3 O 12 thin films deposited by radio-frequency magnetron sputtering

10.1063/1.2131192

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Bibliographic Details
Main Authors: Gao, X.S., Xue, J.M., Wang, J.
Other Authors: MATERIALS SCIENCE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/107172
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Institution: National University of Singapore
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Summary:10.1063/1.2131192

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