Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering

10.1007/s00339-011-6531-9

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Bibliographic Details
Main Authors: Gao, X.S., Wang, J.
Other Authors: NUS NANOSCIENCE & NANOTECH INITIATIVE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/115168
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Institution: National University of Singapore