Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering
10.1007/s00339-011-6531-9
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Main Authors: | , |
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Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/115168 |
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Institution: | National University of Singapore |