Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering
10.1007/s00339-011-6531-9
Saved in:
Main Authors: | , |
---|---|
Other Authors: | |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/115168 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
id |
sg-nus-scholar.10635-115168 |
---|---|
record_format |
dspace |
spelling |
sg-nus-scholar.10635-1151682023-10-30T22:03:13Z Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering Gao, X.S. Wang, J. NUS NANOSCIENCE & NANOTECH INITIATIVE 10.1007/s00339-011-6531-9 Applied Physics A: Materials Science and Processing 105 4 997-1001 APAMF 2014-12-12T07:11:58Z 2014-12-12T07:11:58Z 2011-12 Article Gao, X.S., Wang, J. (2011-12). Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering. Applied Physics A: Materials Science and Processing 105 (4) : 997-1001. ScholarBank@NUS Repository. https://doi.org/10.1007/s00339-011-6531-9 09478396 http://scholarbank.nus.edu.sg/handle/10635/115168 000297162000029 Scopus |
institution |
National University of Singapore |
building |
NUS Library |
continent |
Asia |
country |
Singapore Singapore |
content_provider |
NUS Library |
collection |
ScholarBank@NUS |
description |
10.1007/s00339-011-6531-9 |
author2 |
NUS NANOSCIENCE & NANOTECH INITIATIVE |
author_facet |
NUS NANOSCIENCE & NANOTECH INITIATIVE Gao, X.S. Wang, J. |
format |
Article |
author |
Gao, X.S. Wang, J. |
spellingShingle |
Gao, X.S. Wang, J. Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering |
author_sort |
Gao, X.S. |
title |
Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering |
title_short |
Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering |
title_full |
Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering |
title_fullStr |
Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering |
title_full_unstemmed |
Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering |
title_sort |
leakage behaviors of ferroelectric (bi 3.15nd 0.85) ti 3o 12 thin film derived from rf sputtering |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/115168 |
_version_ |
1781789356117196800 |