Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering

10.1007/s00339-011-6531-9

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Main Authors: Gao, X.S., Wang, J.
Other Authors: NUS NANOSCIENCE & NANOTECH INITIATIVE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/115168
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spelling sg-nus-scholar.10635-1151682023-10-30T22:03:13Z Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering Gao, X.S. Wang, J. NUS NANOSCIENCE & NANOTECH INITIATIVE 10.1007/s00339-011-6531-9 Applied Physics A: Materials Science and Processing 105 4 997-1001 APAMF 2014-12-12T07:11:58Z 2014-12-12T07:11:58Z 2011-12 Article Gao, X.S., Wang, J. (2011-12). Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering. Applied Physics A: Materials Science and Processing 105 (4) : 997-1001. ScholarBank@NUS Repository. https://doi.org/10.1007/s00339-011-6531-9 09478396 http://scholarbank.nus.edu.sg/handle/10635/115168 000297162000029 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1007/s00339-011-6531-9
author2 NUS NANOSCIENCE & NANOTECH INITIATIVE
author_facet NUS NANOSCIENCE & NANOTECH INITIATIVE
Gao, X.S.
Wang, J.
format Article
author Gao, X.S.
Wang, J.
spellingShingle Gao, X.S.
Wang, J.
Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering
author_sort Gao, X.S.
title Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering
title_short Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering
title_full Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering
title_fullStr Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering
title_full_unstemmed Leakage behaviors of ferroelectric (Bi 3.15Nd 0.85) Ti 3O 12 thin film derived from RF sputtering
title_sort leakage behaviors of ferroelectric (bi 3.15nd 0.85) ti 3o 12 thin film derived from rf sputtering
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/115168
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