Transmission electron microscopy observation of CMOS devices of titanium self-aligned silicide technology with nitrogen (N+) implantation process
10.1023/A:1006680617207
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sg-nus-scholar.10635-1072482023-10-25T22:29:33Z Transmission electron microscopy observation of CMOS devices of titanium self-aligned silicide technology with nitrogen (N+) implantation process Jia, Y.M. Lim, C.W. Bourdillon, A.J. Boothroyd, C. MATERIALS SCIENCE 10.1023/A:1006680617207 Journal of Materials Science Letters 18 5 385-388 JMSLD 2014-10-29T08:41:32Z 2014-10-29T08:41:32Z 1999-03-01 Article Jia, Y.M., Lim, C.W., Bourdillon, A.J., Boothroyd, C. (1999-03-01). Transmission electron microscopy observation of CMOS devices of titanium self-aligned silicide technology with nitrogen (N+) implantation process. Journal of Materials Science Letters 18 (5) : 385-388. ScholarBank@NUS Repository. https://doi.org/10.1023/A:1006680617207 02618028 http://scholarbank.nus.edu.sg/handle/10635/107248 000080387100013 Scopus |
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10.1023/A:1006680617207 |
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MATERIALS SCIENCE |
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MATERIALS SCIENCE Jia, Y.M. Lim, C.W. Bourdillon, A.J. Boothroyd, C. |
| format |
Article |
| author |
Jia, Y.M. Lim, C.W. Bourdillon, A.J. Boothroyd, C. |
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Jia, Y.M. Lim, C.W. Bourdillon, A.J. Boothroyd, C. Transmission electron microscopy observation of CMOS devices of titanium self-aligned silicide technology with nitrogen (N+) implantation process |
| author_sort |
Jia, Y.M. |
| title |
Transmission electron microscopy observation of CMOS devices of titanium self-aligned silicide technology with nitrogen (N+) implantation process |
| title_short |
Transmission electron microscopy observation of CMOS devices of titanium self-aligned silicide technology with nitrogen (N+) implantation process |
| title_full |
Transmission electron microscopy observation of CMOS devices of titanium self-aligned silicide technology with nitrogen (N+) implantation process |
| title_fullStr |
Transmission electron microscopy observation of CMOS devices of titanium self-aligned silicide technology with nitrogen (N+) implantation process |
| title_full_unstemmed |
Transmission electron microscopy observation of CMOS devices of titanium self-aligned silicide technology with nitrogen (N+) implantation process |
| title_sort |
transmission electron microscopy observation of cmos devices of titanium self-aligned silicide technology with nitrogen (n+) implantation process |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/107248 |
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1781788364059443200 |