In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400 °C

In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400 °C

10.1016/j.ssc.2003.09.004

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Bibliographic Details
Main Authors: Lee, P.S., Pey, K.L., Mangelinck, D., Ding, J., Chan, L.
Other Authors: MATERIALS SCIENCE
Format: Review
Published: 2014
Subjects:
A. Semiconductor
A. Surfaces and interfaces
A. Thin films
Online Access:http://scholarbank.nus.edu.sg/handle/10635/107332
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Institution: National University of Singapore
Description
Summary:10.1016/j.ssc.2003.09.004

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