In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400 °C

10.1016/j.ssc.2003.09.004

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Bibliographic Details
Main Authors:	Lee, P.S., Pey, K.L., Mangelinck, D., Ding, J., Chan, L.
Other Authors:	MATERIALS SCIENCE
Format:	Review
Published:	2014
Subjects:	A. Semiconductor A. Surfaces and interfaces A. Thin films
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/107332
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-107332
record_format	dspace
spelling	sg-nus-scholar.10635-1073322023-10-26T08:17:01Z In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400 °C Lee, P.S. Pey, K.L. Mangelinck, D. Ding, J. Chan, L. MATERIALS SCIENCE A. Semiconductor A. Surfaces and interfaces A. Thin films 10.1016/j.ssc.2003.09.004 Solid State Communications 128 9-10 325-328 SSCOA 2014-10-29T08:42:48Z 2014-10-29T08:42:48Z 2003-12 Review Lee, P.S., Pey, K.L., Mangelinck, D., Ding, J., Chan, L. (2003-12). In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400 °C. Solid State Communications 128 (9-10) : 325-328. ScholarBank@NUS Repository. https://doi.org/10.1016/j.ssc.2003.09.004 00381098 http://scholarbank.nus.edu.sg/handle/10635/107332 000186266200001 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	A. Semiconductor A. Surfaces and interfaces A. Thin films
spellingShingle	A. Semiconductor A. Surfaces and interfaces A. Thin films Lee, P.S. Pey, K.L. Mangelinck, D. Ding, J. Chan, L. In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400 °C
description	10.1016/j.ssc.2003.09.004
author2	MATERIALS SCIENCE
author_facet	MATERIALS SCIENCE Lee, P.S. Pey, K.L. Mangelinck, D. Ding, J. Chan, L.
format	Review
author	Lee, P.S. Pey, K.L. Mangelinck, D. Ding, J. Chan, L.
author_sort	Lee, P.S.
title	In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400 °C
title_short	In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400 °C
title_full	In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400 °C
title_fullStr	In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400 °C
title_full_unstemmed	In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400 °C
title_sort	in situ xrd analysis of ni(pt)/si(100) reactions in low temperature regime ≤400 °c
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/107332
_version_	1781788377350144000

In situ XRD analysis of Ni(Pt)/Si(100) reactions in low temperature regime ≤400 °C

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