Amorphous (CeO2)0.67(Al2O3)0.33 high-k gate dielectric thin films on silicon

10.1088/0268-1242/18/7/101

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Bibliographic Details
Main Authors:	Yan, L., Kong, L.B., Li, Q., Ong, C.K.
Other Authors:	TEMASEK LABORATORIES
Format:	Others
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/111657
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-1116572023-10-30T22:56:02Z Amorphous (CeO2)0.67(Al2O3)0.33 high-k gate dielectric thin films on silicon Yan, L. Kong, L.B. Li, Q. Ong, C.K. TEMASEK LABORATORIES PHYSICS INSTITUTE OF ENGINEERING SCIENCE 10.1088/0268-1242/18/7/101 Semiconductor Science and Technology 18 7 L39-L41 SSTEE 2014-11-28T01:54:44Z 2014-11-28T01:54:44Z 2003-07 Others Yan, L., Kong, L.B., Li, Q., Ong, C.K. (2003-07). Amorphous (CeO2)0.67(Al2O3)0.33 high-k gate dielectric thin films on silicon. Semiconductor Science and Technology 18 (7) : L39-L41. ScholarBank@NUS Repository. https://doi.org/10.1088/0268-1242/18/7/101 02681242 http://scholarbank.nus.edu.sg/handle/10635/111657 000184388500001 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1088/0268-1242/18/7/101
author2	TEMASEK LABORATORIES
author_facet	TEMASEK LABORATORIES Yan, L. Kong, L.B. Li, Q. Ong, C.K.
format	Others
author	Yan, L. Kong, L.B. Li, Q. Ong, C.K.
spellingShingle	Yan, L. Kong, L.B. Li, Q. Ong, C.K. Amorphous (CeO2)0.67(Al2O3)0.33 high-k gate dielectric thin films on silicon
author_sort	Yan, L.
title	Amorphous (CeO2)0.67(Al2O3)0.33 high-k gate dielectric thin films on silicon
title_short	Amorphous (CeO2)0.67(Al2O3)0.33 high-k gate dielectric thin films on silicon
title_full	Amorphous (CeO2)0.67(Al2O3)0.33 high-k gate dielectric thin films on silicon
title_fullStr	Amorphous (CeO2)0.67(Al2O3)0.33 high-k gate dielectric thin films on silicon
title_full_unstemmed	Amorphous (CeO2)0.67(Al2O3)0.33 high-k gate dielectric thin films on silicon
title_sort	amorphous (ceo2)0.67(al2o3)0.33 high-k gate dielectric thin films on silicon
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/111657
_version_	1781789003664588800

Amorphous (CeO2)0.67(Al2O3)0.33 high-k gate dielectric thin films on silicon

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